New Prospect of Successors to ArF Water-Immersion Lithography
نویسندگان
چکیده
منابع مشابه
Technology backgrounder: Immersion Lithography
The growth of the semiconductor industry is driven by Moore’s law: “The complexity for minimum component cost has increased at a rate of roughly a factor of two per year” [1]. Notice that Moore observed that not only was the number of components doubling yearly, but was doing so at minimum cost. One of the main factors driving the improvements in complexity and cost of ICs, is improvements in p...
متن کاملHigh Refractive Index Immersion Fluids for 193nm Immersion Lithography
For the next-generation immersion lithography technology, there is a growing interest in the immersion fluids having a refractive index larger than 1.5 and low absorbance at 193nm wavelength. In this paper, we report our effort in identifying new immersion fluid candidates. The absolute refractive index values and thermo-optic coefficients, dn/dT, were measured with 1x10 and 1x10 accuracy respe...
متن کاملDevelopment of an Immersion Maskless Lithography System
As lithography quickly approaches its limits with current technologies, a host of new ideas is being proposed in hopes of pushing lithography to new levels of performance. The work presented in this thesis explores the use of an immersion scheme to improve the performance of a maskless lithographic technique known as Zone-Plate-Array Lithography (ZPAL). This is believed to be the first implemen...
متن کاملSympathoadrenal Response to Water Immersion.
M AN IN NORMAL gravity is primarily upright and an efficient system of reflex cardiovascular mechanisms have envolved which compensate for the hydrostatic pressure effects of body fluids due to gravity. When one stands erect most of the large arteries and veins are oriented parallel to the gravitational field and significant hydrostatic pressures are produced in these long columns of blood. 400...
متن کامل25nm Immersion Lithography at a 193nm Wavelength
The physical limitations of lithographic imaging are ultimately imposed by the refractive indices of the materials involved. At oblique collection angles, the numerical aperture of an optical system is determined by nsin(θ) , where n is the lowest material refractive index (in the absence of any refractive power through curvature). For 193nm water immersion lithography, the fluid is the limitin...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Micro/Nanolithography, MEMS, and MOEMS
سال: 2010
ISSN: 1932-5150
DOI: 10.1117/1.3454366